BELMONT, Calif. — Look for Nikon Inc. to introduce a new version of its lithography tools, based on 193-nanometer argon-fluoride (ArF) technology, at next month's Semicon West trade show, according to ...
ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...
New VeritySEM ® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...
Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.
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