It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will support advanced Logic and Memory chip production.

Jun 26, 2023 · IBM Research used one of the first EUV machines in the world, located at Albany Nanotech, to accelerate EUV lithography development for production use. This allowed IBM to …

Apr 23, 2025 · EUV machines use a powerful laser to generate extreme ultraviolet light, which has a much shorter wavelength than traditional light sources used in lithography.

Since extreme ultraviolet light is absorbed by all materials – including air, ZEISS SMT created an optical system for the EUV lithography machine. This operates in the vacuum chamber and is …

Sep 2, 2025 · Learn how EUV lithography uses extreme ultraviolet light and magnetic levitation to create the microchips powering modern electronics.

6 days ago · As the calendar turns to 2026, the global semiconductor landscape has been fundamentally reshaped by a seismic announcement from Shenzhen. Reports have confirmed …

Aug 19, 2025 · EUV lithography is a crucial enabler for the continued scaling of semiconductors, often seen as the driving force behind Moore’s Law. By allowing for smaller feature sizes, EUV …

Dec 18, 2025 · China has reverse-engineered an EUV machine, marking major step toward chip self-sufficiency Secretive project brings Beijing closer to semiconductor independence, once …

3 days ago · A $400 million EUV lithography machine from ASML is critical for producing advanced computer chips, which power modern AI and underpin the digital economy.