It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will support advanced Logic and Memory chip production.

Jun 26, 2023 · IBM Research used one of the first EUV machines in the world, located at Albany Nanotech, to accelerate EUV lithography development for production use. This allowed IBM to insert …

Since extreme ultraviolet light is absorbed by all materials – including air, ZEISS SMT created an optical system for the EUV lithography machine. This operates in the vacuum chamber and is made up of …

Aug 8, 2025 · EUV lithography machines use short-wavelength light to create extremely fine patterns on silicon wafers. They enable smaller transistors, higher chip density, and improved performance while …

Sep 2, 2025 · Learn how EUV lithography uses extreme ultraviolet light and magnetic levitation to create the microchips powering modern electronics.

Beginning with an overview of the fundamental principles of photolithography, the main components and functionalities of EUV scanners are described. It also covers exposure tools that support...

Jan 1, 2026 · As the calendar turns to 2026, the global semiconductor landscape has been fundamentally reshaped by a seismic announcement from Shenzhen. Reports have confirmed that a …

Aug 19, 2025 · EUV lithography is a crucial enabler for the continued scaling of semiconductors, often seen as the driving force behind Moore’s Law. By allowing for smaller feature sizes, EUV technology …

Extreme ultraviolet lithography (EUV) is an advanced technique essential for the production of semiconductor chips, which are integral to a wide range of electronic devices, from smartphones to …